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The information presented in this cross reference is based on TOSHIBA's selection criteria and should be treated as a suggestion only. Please carefully review the latest versions of all relevant information on the TOSHIBA products, including without limitation data sheets and validate all operating parameters of the TOSHIBA products to ensure that the suggested TOSHIBA products are truly compatible with your design and application.
Please note that this cross reference is based on TOSHIBA's estimate of compatibility with other manufacturers' products, based on other manufacturers' published data, at the time the data was collected.
TOSHIBA is not responsible for any incorrect or incomplete information. Information is subject to change at any time without notice.
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与硅(Si)相比,碳化硅(SiC)是一种介电击穿强度更大、饱和电子漂移速度更快且热导率更高的半导体材料。因此,与硅器件相比,当用于半导体器件中时,碳化硅器件可以提供高耐压、高速开关和低导通电阻。鉴于该特性,其将成为有助于降低能耗和缩小系统尺寸的下一代低损耗器件。