* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
* : Products list (parametric search)
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The information presented in this cross reference is based on TOSHIBA's selection criteria and should be treated as a suggestion only. Please carefully review the latest versions of all relevant information on the TOSHIBA products, including without limitation data sheets and validate all operating parameters of the TOSHIBA products to ensure that the suggested TOSHIBA products are truly compatible with your design and application.Please note that this cross reference is based on TOSHIBA's estimate of compatibility with other manufacturers' products, based on other manufacturers' published data, at the time the data was collected.TOSHIBA is not responsible for any incorrect or incomplete information. Information is subject to change at any time without notice.
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下载“第Ⅲ章:晶体管” (PDF:2.0MB)
(1)SJ-MOS在N层具有柱状P层(P柱层)。P层和N层交替排列。(参见图3-9(b))
(2)通过施加VDS,耗尽层在N层中扩展,但其在SJ-MOS中的扩展方式与在一般D-MOS中不同。(关于电场强度,参见图3-9(a)/(b)。电场强度将表示耗尽层的状态。
(3)如果是D-MOS的情况,电场强度在P/N层接口处最强。当电场强度超过硅的极限时,会发生击穿现象,这就是电压极限。另一方面,如果是SJ-MOS的情况,电场强度在N层中是均匀的。
(4)所以,SJ-MOS可采用具有较低电阻的N层设计,以实现低导通电阻产品。
采用与DMOS相同尺寸的芯片,SJ-MOS可以实现更低的导通电阻。